Abstract
Energy harvesting rectennas require ultrafast rectifying diodes that are efficiently matched to the optical nanoantenna. These diodes should possess low on-resistance and high responsivity. Here, we introduce a metal-insulator-metal diode composed of a new material, Ti-TiO2-Al. This diode has a 1.0 nm ultrathin insulator layer fabricated using atomic layer deposition (ALD). It has a zero-bias resistance of 275 ω and a maximum responsivity of 3.1 A/W. To further improve its performance, another ultrathin layer of ZnO was added. The proposed Ti-TiO2/ZnO-Al metal-insulator-insulator-metal diode has a zero-bias resistance of 312 ω and a maximum responsivity of 5.1 A/W. The two types of diodes are fabricated on a SiO2 substrate using conventional photolithography and ALD. Between 20 °C and 55 °C, the I-V characteristics did not show much temperature dependence. The effective barrier height, dielectric constant, and electron effective mass in each insulator are extracted using a constrained and derivative-based optimization algorithm.
| Original language | English |
|---|---|
| Article number | 115207 |
| Journal | AIP Advances |
| Volume | 9 |
| Issue number | 11 |
| DOIs | |
| State | Published - 1 Nov 2019 |
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