Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO₂

Engineering

• Exposure Time 100%
• Flow Rate 50%
• Flow Velocity 50%
• Band Gap 50%
• Ray Photoelectron Spectroscopy 50%
• Absorption Edge 50%
• Deposition System 50%
• Simple Approach 50%

Physics

• Blood Plasma 100%
• Atomic Layer Epitaxy 100%
• Flow Velocity 33%
• Titanium Dioxide 33%
• Energy Gaps (Solid State) 33%

Material Science

• Titanium Dioxide 100%
• UV-Visible Spectroscopy 33%
• Photoemission Spectroscopy 33%