Langmuir probe diagnostics of electron energy distributions with optical emission spectroscopy in capacitively coupled rf discharge in nitrogen

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Abstract

Measurements with a rf compensated Langmuir probe and optical emission spectroscopy are carried out in capacitively coupled rf (13.56 MHz) pure nitrogen N 2 discharges at fixed rf voltage over a wide range of pressure, 30 to 400 mTorr. The electron energy probability function (EEPF) measured below 100 mTorr resembles a bi-Maxwellian-type distribution. At pressure range of 100-200 mTorr, the EEPF has non-Maxwellian distribution with a dip near 4.5 eV. At the highest pressure of 400 mTorr, the EEPF evolves into a Druyvestein-like distribution and the dip disappears. The electron density significantly decreases with increase in the N 2 pressure. On the other hand, the electron temperatures gradually decrease with an increase in N 2 pressure, reaching minimum at 150 mTorr, beyond which it abruptly increases. Such evolution of the EEPFs shape with gas pressure has been discussed in terms of non-local electron kinetics and heating mode transition. The emission intensities of nitrogen (0-0) band of second positive system at 337.1 nm and (0-0) band of first negative systems at 391.4 nm are used to determine the dependence of their radiative states N 2 (C 3 u) and N 2 + (B 2 u +) with nitrogen pressure. It is observed that the pressure influences the radiative states differently owing to their different populating mechanisms. The vibrational temperature T ib and rotational temperature T rot are measured for the sequence ( = - 2) of N 2 second positive system (C 3 → B 3 g) using the method of comparing the measured and calculated spectra with a chi-squared minimization procedure. It was found that both T ib and T rot have similar dependences with N 2 pressure; peaked at 100 mTorr beyond which it monotonically decreases with increase in the N 2 pressure. The correlation between the observed maximum value of T ib around 100 mTorr and the detected dip in the EEPF in the same pressure range has been discussed.

Original languageEnglish
Article number113303
JournalJournal of Applied Physics
Volume110
Issue number11
DOIs
StatePublished - 1 Dec 2011

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